Lithographic apparatus, device manufacturing method and device manufactured thereby

ABSTRACT

A lithographic projection apparatus including at least one temperature control member that at least partly surrounds at least one component selected from a group comprising mask and substrate tables, the projection system and an isolated reference frame for controlling the temperature of the surrounded components. The surface finish of the member is chosen to help keep the components which it partly surrounds isothermal during operation.

This application is a Continuation of U.S. application Ser. No.09/919,616, filed Aug. 1, 2001, now U.S. Pat. No. 6,630,984, whichclaims priority from European Patent application No. 00306684.2, filedAug. 3, 2000, the contents of which are incorporated herein byreference.

BACKGROUND OF THE INVENTION

1. Field of the Invention

The present invention relates generally to a lithographic projectionapparatus and more particularly to a lithographic projection apparatusincluding a temperature control system.

2. Background of the Related Art

The term “patterning structure” as here employed should be broadlyinterpreted as referring to means that can be used to endow an incomingradiation beam with a patterned cross-section, corresponding to apattern that is to be created in a target portion of the substrate; theterm “light valve” can also be used in this context. Generally, the saidpattern will correspond to a particular functional layer in a devicebeing created in the target portion, such as an integrated circuit orother device (see below). Examples of such patterning structure include:

A mask. The concept of a mask is well known in lithography, and itincludes mask types such as binary, alternating phase-shift, andattenuated phase-shift, as well as various hybrid mask types. Placementof such a mask in the radiation beam causes selective transmission (inthe case of a transmissive mask) or reflection (in the case of areflective mask) of the radiation impinging on the mask, according tothe pattern on the mask. In the case of a mask, the support structurewill generally be a mask table, which ensures that the mask can be heldat a desired position in the incoming radiation beam, and that it can bemoved relative to the beam if so desired;

A programmable mirror array. An example of such a device is amatrix-addressable surface having a viscoelastic control layer and areflective surface. The basic principle behind such an apparatus is that(for example) addressed areas of the reflective surface reflect incidentlight as diffracted light, whereas unaddressed areas reflect incidentlight as undiffracted light. Using an appropriate filter, the saidundiffracted light can be filtered out of the reflected beam, leavingonly the diffracted light behind; in this manner, the beam becomespatterned according to the addressing pattern of the matrix-adressablesurface. The required matrix addressing can be performed using suitableelectronic means. More information on such mirror arrays can be gleaned,for example, from United States patents U.S. Pat. No. 5,296,891 and U.S.Pat. No. 5,523,193, which are incorporated herein by reference. In thecase of a programmable mirror array, the said support structure may beembodied as a frame or table, for example, which may be fixed or movableas required; and

A programmable LCD array. An example of such a construction is given inUnited States patent U.S. Pat. No. 5,229,872, which is incorporatedherein by reference. As above, the support structure in this case may beembodied as a frame or table, for example, which may be fixed or movableas required.

For purposes of simplicity, the rest of this text may, at certainlocations, specifically direct itself to examples involving a mask andmask table; however, the general principles discussed in such instancesshould be seen in the broader context of the patterning structure ashereabove set forth.

Lithographic projection apparatus can be used, for example, in themanufacture of integrated circuits (ICs). In such a case, the patterningstructure may generate a circuit pattern corresponding to an individuallayer of the IC, and this pattern can be imaged onto a target portion(e.g. comprising one or more dies) on a substrate (silicon wafer) thathas been coated with a layer of radiation-sensitive material (resist).In general, a single wafer will contain a whole network of adjacenttarget portions that are successively irradiated via the projectionsystem, one at a time. In current apparatus, employing patterning by amask on a mask table, a distinction can be made between two differenttypes of machine. In one type of lithographic projection apparatus, eachtarget portion is irradiated by exposing the entire mask pattern ontothe target portion at once; such an apparatus is commonly referred to asa wafer stepper. In an alternative apparatus—commonly referred to as astep-and-scan apparatus—each target portion is irradiated byprogressively scanning the mask pattern under the projection beam in agiven reference direction (the “scanning” direction) while synchronouslyscanning the substrate table parallel or anti-parallel to thisdirection; since, in general, the projection system will have amagnification factor M (generally <1), the speed V at which thesubstrate table is scanned will be a factor M times that at which themask table is scanned. More information with regard to lithographicdevices as here described can be gleaned, for example, from U.S. Pat.No. 6,046,792, incorporated herein by reference.

In a manufacturing process using a lithographic projection apparatus, apattern (e.g. in a mask) is imaged onto a substrate that is at leastpartially covered by a layer of radiation-sensitive material (resist).Prior to this imaging step, the substrate may undergo variousprocedures, such as priming, resist coating and a soft bake. Afterexposure, the substrate may be subjected to other procedures, such as apost-exposure bake (PEB), development, a hard bake andmeasurement/inspection of the imaged features. This array of proceduresis used as a basis to pattern an individual layer of a device, e.g. anIC. Such a patterned layer may then undergo various processes such asetching, ion-implantation (doping), metallization, oxidation,chemo-mechanical polishing, etc., all intended to finish off anindividual layer. If several layers are required, then the wholeprocedure, or a variant thereof, will have to be repeated for each newlayer. Eventually, an array of devices will be present on the substrate(wafer). These devices are then separated from one another by atechnique such as dicing or sawing, whence the individual devices can bemounted on a carrier, connected to pins, etc. Further informationregarding such processes can be obtained, for example, from the book“Microchip Fabrication: A Practical Guide to Semiconductor Processing”,Third Edition, by Peter van Zant, McGraw Hill Publishing Co., 1997, ISBN0-07-067250-4, incorporated herein by reference.

For the sake of simplicity, the projection system may hereinafter bereferred to as the “lens”; however, this term should be broadlyinterpreted as encompassing various types of projection system,including refractive optics, reflective optics, and catadioptricsystems, for example. The radiation system may also include componentsoperating according to any of these design types for directing, shapingor controlling the projection beam of radiation, and such components mayalso be referred to below, collectively or singularly, as a “lens”.Further, the lithographic apparatus may be of a type having two or moresubstrate tables (and/or two or more mask tables). In such “multiplestage” devices the additional tables may be used in parallel, orpreparatory steps may be carried out on one or more tables while one ormore other tables are being used for exposures. Twin stage lithographicapparatus are described, for example, in U.S. Pat. No. 5,969,441 and WO98/40791, incorporated herein by reference.

In a lithographic apparatus, the size of features that can be imagedonto the wafer is limited by the wavelength of the projection radiation.To produce integrated circuits with a higher density of devices andhence higher operating speeds, it is desirable to be able to imagesmaller features. While most current lithographic projection apparatusemploy ultraviolet light generated by mercury lamps or excimer lasers,it has been proposed to use shorter wavelength radiation of around 13nm. Such radiation is termed extreme ultraviolet (EUV) or soft x-ray,and possible sources include laser-produced plasma sources, dischargeplasma sources or synchrotron radiation from electron storage rings. Anoutline design of a lithographic projection apparatus using synchrotronradiation is described in “Synchrotron radiation sources and condensersfor projection x-ray lithography”, JB Murphy et al, Applied OpticsVol.32 No. 24 pp 6920-6929 (1993).

Other proposed radiation types include electron beams and ion beams.These types of beam share with EUV the requirement that the beam path,including the mask, substrate and optical components, be kept in a highvacuum. This is to prevent absorption and/or scattering of the beam,whereby a total pressure of less than about 10⁻⁶ millibar is typicallynecessary for such charged particle beams. Wafers can be contaminatedand optical elements for EUV radiation can be spoiled by the depositionof carbon layers on their surface, which imposes the additionalrequirement that hydrocarbon partial pressures should generally be keptbelow 10⁻⁸ or 10⁻⁹ millibar. Otherwise, for apparatus using EUVradiation, the total vacuum pressure need only be 10⁻³ or 10⁻⁴ mbar,which would typically be considered a rough vacuum.

Further information with regard to the use of electron beams inlithography can be gleaned, for example, from U.S. Pat. No. 5,079,122and U.S. Pat. No. 5,260,151, as well as from EP-A 0 965 888.

SUMMARY OF THE INVENTION

Temperature stability of some critical components is quite important inlithographic apparatus, since a change in temperature will lead tothermal expansion or contraction and associated imaging errors. It istherefore an object of the invention to provide an improved lithographicprojection apparatus in which components can better be maintainedisothermal.

According to the present invention, this and other objects are achievedin a lithographic apparatus including a radiation system for providing aprojection beam of radiation, a support structure for supportingpatterning structure, the patterning structure serving to pattern theprojection beam according to a desired pattern, a substrate table forholding a substrate, a projection system for projecting the patternedbeam onto a target portion of the substrate, an isolated reference frameon which position sensors for at least one of the patterning structureand substrate are mounted, a vacuum chamber enclosing at least onecomponent selected from a group comprising said support structure, saidsubstrate table, said projection system and said isolated referenceframe and at least one temperature control member that at leastpartially surrounds one of said components in said vacuum chamber, saidtemperature control member being at least partly formed of a materialhaving at least partly a substantially absorption andemission-inhibiting surface finish for keeping said one componentsubstantially isothermal during operation.

Absorption and emission of a surface are generally related. Lowabsorption implies low emission and vice versa; absorption and emissioncoefficients will have identical values. In case the temperature controlmember is provided with an absorption and emission-inhibiting surfacefinish on a surface facing the surrounded component, a temperaturechange of the temperature control member will not or will hardlyconstitute a heat load on the components through radiation since theemission coefficient will be very low, meaning that the control memberwill not or will hardly radiate energy and that the temperature of thecomponent will not be effected. On the other hand, in case thetemperature control member is provided with an absorption andemission-inhibiting surface finish on a surface facing away from thesurrounded component and facing towards an external heat source, thetemperature of the control member will not or hardly change since itwill not absorb the energy radiated by the heat source. Since thetemperature of the control member does not change, it will not present aheat load on the surrounded component. Preferably, the emissioncoefficient of the absorption and emission-inhibiting surface finish isless than 0.1, and more preferably less than 0.05. Such a surface finishmay be achieved by applying a mirror-like surface finish.

In another embodiment, at least part of a surface of said temperaturecontrol member which faces towards at least one of said component and aheat source internal of said vacuum chamber comprises a substantiallyabsorption and emission promoting surface finish. For this embodiment,the temperature of the component may be regulated by radiation incidentfrom the control member. On the other hand, any radiation from a heatsource that faces the absorption and emission promoting surface finishwill be absorbed by that surface of the temperature control member andbecome absorbed. In this way it is prevented that the heat source isreflected by that surface and becomes a heat load on the criticalcomponent. The emission coefficient of the absorption and emissionpromoting surface finish may be at least 0.9, and more specifically, maybe at least 0.95. Such a surface finish may be applied by applying ablack surface finish.

Further, the temperature control member preferably has a large thermalconductivity, advantageously above 100 W/milliKelvin (W/mK) to keep thetemperature control member in a predetermined temperature range.

The temperature control member may be the wall of the vacuum chamber, aseparate enclosure at a distance from the vacuum chamber wall, or athermal baffle over an opening to a vacuum pump. Such control member mayalso be combined.

According to a further aspect of the invention there is provided adevice manufacturing method including projecting a patterned beam ofradiation onto a target portion of a layer of radiation-sensitivematerial on a substrate; and maintaining a substantially isothermalcondition in a component provided in a vacuum chamber of a lithographicprojection apparatus using at least one temperature control member atleast partially surrounding the component, said temperature controlmember being at least partially formed of a material having anabsorption and emission inhibiting surface finish.

Although specific reference may be made in this text to the use of theapparatus according to the invention in the manufacture of ICs, itshould be explicitly understood that such an apparatus has many otherpossible applications. For example, it may be employed in themanufacture of integrated optical systems, guidance and detectionpatterns for magnetic domain memories, liquid-crystal display panels,thin-film magnetic heads, etc. The skilled artisan will appreciate that,in the context of such alternative applications, any use of the terms“reticle”, “wafer” or “die” in this text should be considered as beingreplaced by the more general terms “mask”, “substrate” and “targetportion”, respectively.

In the present document, the terms “radiation” and “beam” are used toencompass all types of electromagnetic radiation, including ultravioletradiation (e.g. with a wavelength of 365, 248, 193, 157 or 126 nm) andextreme ultraviolet (EUV or XUV) radiation (e.g. having a wavelength inthe range 5-20 nm), as well as particle beams, such as ion beams orelectron beams.

BRIEF DESCRIPTION OF THE DRAWINGS

Embodiments of the invention will now be described, by way of exampleonly, with reference to the accompanying schematic drawings in which:

FIG. 1 depicts a lithographic projection apparatus according to anembodiment of the invention.

DETAILED DESCRIPTION

FIG. 1 schematically depicts a lithographic projection apparatusaccording to a particular embodiment of the invention. The apparatuscomprises:

a radiation system Ex, IL, for supplying a projection beam PB ofradiation (e.g. EUV radiation). In this particular case, the radiationsystem also comprises a radiation source LA;

a first object table (mask table) MT provided with a mask holder forholding a mask MA (e.g. a reticle), and connected to first positioningmeans for accurately positioning the mask with respect to item PL;

a second object table (substrate table) WT provided with a substrateholder for holding a substrate W (e.g. a resist-coated silicon wafer),and connected to second positioning means for accurately positioning thesubstrate with respect to item PL;

a projection system (“lens”) PL (e.g. a reflective projection system)for imaging an irradiated portion of the mask MA onto a target portion C(e.g. comprising one or more dies) of the substrate W.

As here depicted, the apparatus is of a reflective type (i.e. has areflective mask). However, in general, it may also be of a transmissivetype, for example (with a transmissive mask). Alternatively, theapparatus may employ another kind of patterning structure, such as aprogrammable mirror array of a type as referred to above.

The source LA (e.g. laser-produced plasma source or a discharge source)produces a beam of radiation. This beam is fed into an illuminationsystem (illuminator) IL, either directly or after having traversedconditioning means, such as a beam expander, for example. Theilluminator IL may comprise adjusting means for setting the outer and/orinner radial extent (commonly referred to as σ-outer and σ-inner,respectively) of the intensity distribution in the beam. In addition, itwill generally comprise various other components, such as an integratorand a condenser. In this way, the beam PB impinging on the mask MA has adesired uniformity and intensity distribution in its cross-section.

It should be noted with regard to FIG. 1 that the source LA may bewithin the housing of the lithographic projection apparatus (as is oftenthe case when the source LA is a mercury lamp, for example), but that itmay also be remote from the lithographic projection apparatus, theradiation beam which it produces being led into the apparatus (e.g. withthe aid of suitable directing mirrors); this latter scenario is oftenthe case when the source LA is an excimer laser. The current inventionand claims encompass both of these scenarios.

The beam PB subsequently intercepts the mask MA, which is held on a masktable MT. Having been selectively reflected by the mask MA, the beam PBpasses through the lens PL, which focuses the beam PB onto a targetportion C of the substrate W. With the aid of the second positioningmeans (and interferometric measuring means IF), the substrate table WTcan be moved accurately, e.g. so as to position different targetportions C in the path of the beam PB. Similarly, the first positioningmeans can be used to accurately position the mask MA with respect to thepath of the beam PB, e.g. after mechanical retrieval of the mask MA froma mask library, or during a scan. In general, movement of the objecttables MT, WT will be realized with the aid of a long-stroke module(coarse positioning) and a short-stroke module (fine positioning), whichare not explicitly depicted in FIG. 1. However, in the case of a waferstepper (as opposed to a step-and-scan apparatus) the mask table MT mayjust be connected to a short stroke actuator, or may be fixed.

The depicted apparatus can be used in two different modes:

1. In step mode, the mask table MT is kept essentially stationary, andan entire mask image is projected at once (i.e. a single “flash”) onto atarget portion C. The substrate table WT is then shifted in the x and/ory directions so that a different target portion C can be irradiated bythe beam PB; and

2. In scan mode, essentially the same scenario applies, except that agiven target portion C is not exposed in a single “flash”. Instead, themask table MT is movable in a given direction (the so-called “scandirection”, e.g. the y direction) with a speed v, so that the projectionbeam PB is caused to scan over a mask image; concurrently, the substratetable WT is simultaneously moved in the same or opposite direction at aspeed V=Mv, in which M is the magnification of the lens PL (typically,M=¼ or ⅕). In this manner, a relatively large target portion C can beexposed, without having to compromise on resolution.

The lithographic projection apparatus of the example includes a vacuumchamber VC in which the beam PB impinges upon the mask MA andsubsequently onto the target area of the substrate W.

A so-called “metrology frame” MF provides an isolated frame ofreference, which is mechanically isolated from the main apparatusstructure, to support sensitive components such as the interferometersIF and other position sensors and isolate them from vibration. Eventhough the reference frame may be made of a material with a very lowcoefficient of thermal expansion, such as Invar (TM), the metrologyframe and attached components should be kept isothermal but if not themaximum temperature difference should be less than 0.1° C.

The lithographic projection apparatus of the present embodiment includesan enclosure as a temperature control member surrounding some componentsto influence the temperature of the components surrounded by theenclosure. Typical components surrounded by such an enclosure includethe first and second object tables, the projection system and themetrology frame. The enclosure is at least partially formed by the wallsof the vacuum chamber VC in the present embodiment. Another enclosure TEis seen to be present between a part of the vacuum chamber wall andtemperature critical components. The drawing is for illustrativepurposes only. In a practical situation such a thermal enclosure TE mayenclose such a critical component fully.

A vacuum pump VP is associated with the vacuum chamber and may be atquite a high temperature. For example, the rotor of a turbo-molecularpump may be as high as 80° C. Providing a thermal baffle TB, as anothertemperature control member, over the opening to the vacuum pump aids inkeeping the components inside the vacuum chamber isothermal.

According to the present invention a special surface finish is appliedto the temperature control members in the lithographic projectionapparatus for controlling the temperature of components which the memberat least partly surrounds. The members of interest may be those of anenclosure, a vacuum chamber wall or a thermal baffle as described above.

The members for controlling the temperature are provided with amirror-like surface finish, e.g. by polishing. Such a surface finishprovides an absorption and emission-inhibiting surface finish having alow emissivity or emission coefficient, preferably below 0.1 or evenbelow 0.05. Also preferably, the mirror-like surface finish is appliedto material which has a low emission coefficient itself. The mirror-likesurface finish is applied to the inside surface of the wall of vacuumchamber VC, to the outside of enclosure TE facing the vacuum chamberwall and on both sides (facing towards vacuum pump VC and towardsenclosure TE) of baffle TB.

The result of this is that thermal variations in the vacuum chamber wallare not radiated onto the partly surrounded components; precisetemperature control of the wall is not a very important issue because itdoes not radiate much energy. In this embodiment, the vacuum chamberwall has a surface prepared such that the emissivity, the ratio ofemissive power of a surface at a given temperature to that of a blackbody at the same temperature and with the same surroundings, isoptimally at most 0.1 and preferably no higher than 0.05. In this waythe maximum temperature difference in the partly surrounded componentsmay be kept as low as 0.1° C. which is the requirement in somelithographic projection apparatus.

However, heat sources within the vacuum chamber may have their radiationreflected by the mirror-like vacuum chamber wall onto temperaturecritical components. A separate enclosure TE having a surface finishthat promotes absorption is therefore employed. The absorption (andemission) promoting surface finish of temperature control member TE isapplied at a surface facing towards the inside of the vacuum chamber.Radiation from heat sources will be absorbed and not be reflected andconstitute a heat load on other components. A black-surface finish willprovide a high emissivity or emission coefficient having preferably avalue above 0.9 or even 0.95. A vacuum-compatible coating of SiO₂ alsoprovides a high emission coefficient of about 0.9. In this way thetemperature of the partly enclosed components can also be controlled tobe the same as that of enclosure TE because the enclosure radiatesefficiently and efficiently absorbs radiation irradiated by the enclosedcomponents

The side of enclosure TE facing the vacuum chamber wall is provided withan absorption inhibiting (mirror-like) surface finish to reflect anyresidual radiation from vacuum chamber wall VC or thermal baffle TB. Inthis way an even better temperature control will be achieved. Thermalbaffle TB is provided with an absorption and emission-inhibiting surfacefinish on both sides to not absorb radiation from vacuum pump VP and tonot radiate towards enclosure TE for better temperature control.

Enclosure TE may also be constructed such that it tightly encloses atemperature-critical component inside the vacuum chamber. Further, thetemperature-critical component may be provided with anabsorption-inhibiting surface finish to reflect any residual heat loadradiation or with an absorption-promoting surface finish for efficienttemperature control by enclosure TE.

It has also been found that materials with a thermal conductivity ofgreater than 100 W/mK result in the temperature of the enclosure beingadvantageously kept more nearly uniform. Preferably the material of themember for controlling temperature has a thermal conductivity of greaterthan 200 W/mK. Examples of such materials are aluminum, copper andalloys thereof. Any means of regulating the temperature of thetemperature control member are also advantageously employed, such aprovision of channels in the temperature control member for passing afluid such as water.

While specific embodiments of the invention have been described above,it will be appreciated that the invention may be practiced otherwisethan as described. The description is not intended to limit theinvention.

1. A lithographic projection apparatus comprising: a radiation system toprovide a projection beam of radiation; a support structure to support apatterning structure to pattern the projection beam according to adesired pattern; a substrate table to hold a substrate; a projectionsystem to project the patterned beam onto a target portion of thesubstrate; a vibrationally isolated reference frame; at least oneposition sensor constructed and arranged to monitor a position of atleast one of the patterning structure and substrate mounted on thereference frame; and at least one temperature control member operativelyassociated with at least one component selected from a group comprisingsaid support structure, said substrate table, said projection system andsaid isolated reference frame and comprising a substantially absorptionand emission-inhibiting surface finish such that said at least onecomponent is maintained substantially isothermal during operation.
 2. Anapparatus according to claim 1, wherein said absorption andemission-inhibiting surface finish comprises a substantially mirror-likesurface finish.
 3. An apparatus according to claim 1, wherein anemission coefficient of said absorption and emission-inhibiting surfacefinish is less than 0.1.
 4. An apparatus according to claim 3, whereinsaid emission coefficient of said absorption and emission-inhibitingsurface finish is less than 0.05.
 5. An apparatus according to claim 1,wherein the apparatus further comprises a chamber substantiallyenclosing at lease one component selected from said group.
 6. Anapparatus according to claim 5, wherein at least part of a surface ofthe temperature control member which faces towards at least onecomponent selected from said group and a heat source internal of saidchamber comprises a substantially absorption and emission-promotingsurface finish.
 7. An apparatus according to claim 6, wherein saidabsorption and emission-promoting surface finish comprises a blacksurface finish.
 8. An apparatus according to claim 6, wherein anemission coefficient of said absorption and emission-promoting surfacefinish is at least 0.9.
 9. An apparatus according to claim 6, whereinsaid emission coefficient of said absorption and emission-promotingsurface finish is at least 0.95.
 10. An apparatus according to claim 1,wherein a surface of said temperature control member which comprisessaid absorption and emission-inhibiting surface finish faces towards aheat source external of a space that is at least partially surrounded bysaid temperature control member and that comprises said component. 11.An apparatus according to claim 1, wherein a thermal conductivity of amaterial of said temperature control member is at least 100 W/mK.
 12. Anapparatus according to claim 1, wherein said temperature control membercomprises a material selected from the group comprising aluminum,aluminum alloys, copper and copper alloys.
 13. An apparatus according toclaim 5, wherein said temperature control member is at least partiallyformed by walls of said chamber.
 14. An apparatus according to claim 1,wherein said temperature control member comprises an enclosure providedat a distance from a wall of said chamber.
 15. An apparatus according toclaim 1, wherein the support structure comprises a mask table forholding a mask.
 16. An apparatus according to claim 1, wherein theradiation system comprises a radiation source.
 17. An apparatusaccording to claim 5, wherein said chamber is a vacuum chamber.
 18. Anapparatus according to claim 17, wherein said temperature control membercomprises a wall of a thermal baffle provided over an opening to a pump,in particular a vacuum pump.
 19. An apparatus according to claim 1,wherein said projection beam comprises EUV radiation having a wavelengthin the range of 5 to 20 nm.
 20. A device manufacturing methodcomprising: projecting a patterned beam of radiation onto a targetportion of a layer of radiation-sensitive material on a substrate; andmaintaining a substantially isothermal condition in a component providedin a lithographic projection apparatus using at least one temperaturecontrol member at least partially surrounding the component, saidtemperature control member being at least partially formed of a materialhaving an absorption and emission inhibiting surface finish.
 21. Adevice manufactured according to the method of claim 20.